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基于大失配外延的氮化物第三代半導(dǎo)體材料與器件Nitride Semiconductor Materials and Devices Based on Large Mismatch Epitaxy沈波北京大學(xué)理學(xué)部副主任、特聘教授SHEN Bo Deputy Deanand Distinguished Professorof Facultyof Science, Peking University

半導(dǎo)體材料產(chǎn)業(yè)的現(xiàn)狀和挑戰(zhàn)Status and Challenge of Semiconductor Material Industry楊德仁中國科學(xué)院院士、浙大寧波理工學(xué)院校長、浙江大學(xué)硅及先進(jìn)半導(dǎo)體材料全國重點實驗室主任、教授YANG DerenAcademician of Chinese Academy of Sciences,President of NingboTech University, Professor and Director of State Key Laboratory of Silicon and Advanced Semiconductor Materials, Zhejiang University

GaN基光電材料外延與MOCVD反應(yīng)腔結(jié)構(gòu)關(guān)聯(lián)性研究Research on the Correlation Between GaN-based Optoelectronic Material Epitaxy and MOCVD Reactor Chamber Structure姚威振中國科學(xué)院半導(dǎo)體研究所副研究員、中科重儀半導(dǎo)體聯(lián)合創(chuàng)始人YAO WeizhenAssociate Professor of Institute of Semiconductors, Chinese Academy of Sciences, Co-founder of CASInstruments Semiconductor Co., Ltd.

硅襯底GaN基光電材料外延生長Epitaxial Growth of GaN Based Photoelectric Materials on Silicon Substrate孫錢中國科學(xué)院蘇州納米技術(shù)與納米仿生研究所研究員SUN QianProfessorof Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences

氮化鋁基半導(dǎo)體材料及器件的最新進(jìn)展Recent Progress on AlN-based Semiconductor Materials and Devices谷保芳孝日本NTT基礎(chǔ)研究實驗室負(fù)責(zé)人、資深杰出研究員Taniyasu YOSHITAKAGroup leader and Senior Distinguished Researcher of NTT Basic Research Laboratories, NTT Corporation

氮化鋁單晶材料研究進(jìn)展與應(yīng)用展望Research Progress and Application Prospect of AlN Single Crystal Materials程紅娟中國電子科技集團(tuán)第四十六所新材料研發(fā)中心副主任CHENG HongjuanDeputy Director of New Materials Research and Development Center of CETC 46THInstitute

第四代半導(dǎo)體材料平坦化研究進(jìn)展Research Progress on Planarization of Fourth Generation Semiconductor Materials趙志強北京艾姆希半導(dǎo)體科技有限公司銷售總監(jiān)ZHAO ZhiqiangSales Director of MCF Technologies Ltd.

氧化鎵材料和電子器件的熱特性Thermal Characteristics of Ga2O3Materials and Electronic Devices孫華銳哈爾濱工業(yè)大學(xué)（深圳）教授，理學(xué)院副院長SUN HuaruiProfessor of Harbin Institute of Technology, Shenzhen

電流/功率截止頻率為135/310 GHz的高性能硅基InAlN/GaN HEMTsHigh-Performance InAlN/GaN HEMTs on Silicon Substrate with fT/fmax of 135/310 GHz 崔鵬山東大學(xué)新一代半導(dǎo)體材料研究院研究員CUIPengResearch Fellow of the Institute of Novel Semiconductor of Shandong University

無等離子體損傷GaN HEMT極化隔離的設(shè)計與優(yōu)化Design and optimization of polarization isolation toward plasma-damage-free GaN HEMT戴貽鈞中國科學(xué)院寧波材料技術(shù)與工程研究所DAI YiyunNingbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences

新型寬禁帶壓電半導(dǎo)體材料-Ga2O3及其在射頻諧振器中的應(yīng)用-Ga2O3: an Emerging Wide Bandgap Piezoelectric Semiconductor for Application in Radio Frequency Resonators王鋼中山大學(xué)佛山研究院院長，中山大學(xué)半導(dǎo)體照明材料及器件國家地方聯(lián)合工程實驗室主任、教授WANG GangProfessor and Dean of Foshan Institute of Sun Yat-Sen University; Director of the National-Local Joint Engineering Laboratory of Semiconductor

用于先進(jìn)SiC功率模塊的整體解決（核心設(shè)備/材料/工程）方案Overall solution (core equipment/materials/engineering) for advanced SiC power module周鑫蘇州博湃半導(dǎo)體技術(shù)有限公司市場銷售總監(jiān)ZHOU XinDirector of Sales Marketing, Suzhou Bopai Semiconductor Technology Co., Ltd.

高性能GaN-on-GaN材料與器件的外延生長High output power and bandwidth of c-plane GaN-on-GaN micro-LED for high-speed visible light communication王國斌江蘇第三代半導(dǎo)體研究院研發(fā)部負(fù)責(zé)人WANG GuobinSenior Project ManagerHead of RD Dept of Jiangsu Institute of Advanced Semiconductors

平片藍(lán)寶石襯底上高質(zhì)量AlN材料MOCVD外延生長High quality AlN growth on flat sapphire at relative low temperature by MOCVD趙德剛中國科學(xué)院半導(dǎo)體所研究員ZHAO DegangProfesor of Institute of Semiconductors, CAS

垂直氮化鎵器件，尤其是硅襯底上，因其低成本襯底而引起了人們對大功率應(yīng)用的廣泛關(guān)注。但其性能仍低于氮化鎵襯底上的垂直氮化鎵器件。關(guān)鍵問題是在硅襯底上實現(xiàn)低位錯密度和連續(xù)厚氮化鎵層具有挑戰(zhàn)性。會上，北京大學(xué)馮玉霞博士結(jié)合具體的研究實踐，分享了Si襯底上GaN基外延材料生長及雜質(zhì)缺陷研究的成果，首次提供了在C摻雜半絕緣氮化鎵中取代C原子占據(jù)N位點的明確證據(jù)。

西安電子科技大學(xué)教授張金風(fēng)做了題為金剛石超寬禁帶半導(dǎo)體材料和器件新進(jìn)展的主題報告。她介紹說，金剛石屬于新興的超寬禁帶半導(dǎo)體材料，具有禁帶寬度大，耐擊穿，載流子遷移率高，熱導(dǎo)率極高，抗輻照等優(yōu)點。在熱沉，大功率、高頻器件，光學(xué)窗口，量子信息等領(lǐng)域具有極大應(yīng)用潛力。報告中介紹了大尺寸金剛石單晶的制備方法最成功的是同質(zhì)外延的克隆拼接生長方法和在Ir襯底上異質(zhì)外延的生長方法。她表示，實現(xiàn)室溫下高電離率的體摻

英諾賽科研發(fā)中心副總裁David C. ZHOU分享了《200mm 40V-650V E型硅基氮化鎵材料功率器件技術(shù)：從器件、封裝、到系統(tǒng)》研究報告