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  • 西安電子科技大學副校
    高功率寬禁帶半導體射頻器件研究進展Research Progress of High Power Wide Band-gap Semiconductor RF Devices張進成西安電子科技大學副校長、教授ZHANG JinchengVice PresidentProfessor of Xidian University
    324300
    IFWS2025-01-09 15:50
  • 華潤微電子有限公司總
    融通半導體產(chǎn)業(yè)鏈 構(gòu)建應用創(chuàng)新生態(tài)圈Integrate Semiconductor Industry Chain to Build Application Innovation Ecosystem李虹華潤微電子有限公司總裁LI HongPresident of China Resources Microelectronics Limited
    175400
    IFWS2025-01-09 15:44
  • 濱田公守:最新高性能S
    最新高性能SiC MOSFET技術助力未來SiC市場的發(fā)展趨勢The Latest High Performance SiC MOSFET Technology Trend for Future SiC Market Development濱田公守日本華為股份有限公司高級首席專家Kimimori HAMADASenior Chief Expert Huawei Technologies Japan
    222500
    IFWS2025-01-09 15:43
  • 北京大學理學部副主任
    基于大失配外延的氮化物第三代半導體材料與器件Nitride Semiconductor Materials and Devices Based on Large Mismatch Epitaxy沈波北京大學理學部副主任、特聘教授SHEN Bo Deputy Deanand Distinguished Professorof Facultyof Science, Peking University
    322700
    IFWS2025-01-09 15:42
  • 美國 PowerAmerica 執(zhí)
    加快碳化硅芯片和電力電子器件的商業(yè)化發(fā)展Accelerating Commercialization of SiC Chips and Power ElectronicsVictor VELIADIS美國PowerAmerica執(zhí)行董事兼CTO、ICSCRM 2024 大會主席、北卡羅萊納州立大學教授、IEEE寬禁帶功率半導體技術路線圖委員會(ITRW)主席Victor VELIADISExecutiveDirector and CTO of PowerAmerica, Chair of ICSCRM 2024, Professor of North Carolina State Universityand Chair of ITRW ( IEEE Wide Ban
    333700
    IFWS2025-01-09 15:39
  • 2024年度中國第三代半
    2024中國第三代半導體技術十大進展/ 2024 China's Top 10 Advances in Wide Band-gap Semiconductor Technology
    455900
    IFWS2025-01-09 15:38
  • 中國科學院院士楊德仁
    半導體材料產(chǎn)業(yè)的現(xiàn)狀和挑戰(zhàn)Status and Challenge of Semiconductor Material Industry楊德仁中國科學院院士、浙大寧波理工學院校長、浙江大學硅及先進半導體材料全國重點實驗室主任、教授YANG DerenAcademician of Chinese Academy of Sciences,President of NingboTech University, Professor and Director of State Key Laboratory of Silicon and Advanced Semiconductor Materials, Zhejiang University
    332700
    IFWS2025-01-09 15:31
  • 北方華創(chuàng)張軼銘:面向
    面向SiC功率器件的裝備與工藝解決方案NAURA Solutions for SiC Power Devices張軼銘北京北方華創(chuàng)微電子裝備有限公司Zhang YimingBeijing NAURA Microelectronics Equipment Co.,Ltd
    55300
    IFWS2025-01-09 15:05
  • 普興電子市場總監(jiān)張國
    大直徑碳化硅外延市場發(fā)展與挑戰(zhàn)Development and Challenges of Large Diameter Silicon Carbide Epitaxial張國良河北普興電子科技股份有限公司市場總監(jiān)ZHANG GuoliangMarketing Director of Hebei Pushing Electronic Technology Co., LTD
    55500
    IFWS2025-01-09 15:04
  • 山東大學教授、南砂晶
    碳化硅單晶缺陷研究及產(chǎn)業(yè)化進展Research and Industrialization Progress of SiC Single Crystal Defects陳秀芳山東大學教授、南砂晶圓董事CHEN XiufangProfessor of Shandong University, Board Director of Guangzhou Summit Crystal Semiconductor Co.,Ltd
    55500
    IFWS2025-01-09 15:03
  • 浙江大學教授皮孝東:
    提拉式物理氣相傳輸法制備碳化硅單晶Single-crystal 4H Silicon Carbide Grown with the Method of Pulling Physical Vapor Transport皮孝東浙江大學教授PI XiaodongProfessor of Zhejiang University
    55500
    IFWS2025-01-09 15:00
  • AIXTRON中國總經(jīng)理方
    化合物半導體外延大規(guī)模量產(chǎn)解決方案High Volume Manufacturing of Compound Semiconductors Epitaxy方子文AIXTRON中國總經(jīng)理FANG ZiwenGM of AIXTRON China
    56000
    IFWS2025-01-09 14:59
  • 韓國東義大學教授Won-
    SiC單晶的坩堝結(jié)構(gòu)及PVT生長工藝條件的改進SiC Single Crystals with Modification of Crucible Structure and Process Condition for PVT GrowthWon-Jae LEE韓國東義大學教授、釜山電力半導體研究所所長Won-JaeLEEProfessor of Dong-Eui University,Director of Busan Power Semiconductor Lab.
    55300
    IFWS2025-01-09 14:55
  • Victor VELIADIS教授
    硅晶圓廠中的SiC制造SiC Fabrication in a Silicon FabVictor VELIADIS美國電力執(zhí)行董事 CTO、ICSCRM2024大會主席、北卡羅來納州立大學教授、IEEE寬禁帶功率半導體技術路線圖委員會(ITRW)主席Victor VELIADISExecutive Director and CTO of PowerAmerica, Chair of ICSCRM 2024, Professor of North Carolina State University and Chair of ITRW
    55400
    IFWS2025-01-09 14:52
  • 西安電子科技大學教授
    AlN基高壓高頻功率器件研究進展及挑戰(zhàn)Research Progress and Application Prospect ofAlNSingle Crystal Materials周弘西安電子科技大學教授ZHOUHongProfessor at Xidian University
    55300
    IFWS2025-01-09 14:43
  • 中科重儀半導體聯(lián)合創(chuàng)
    GaN基光電材料外延與MOCVD反應腔結(jié)構(gòu)關聯(lián)性研究Research on the Correlation Between GaN-based Optoelectronic Material Epitaxy and MOCVD Reactor Chamber Structure姚威振中國科學院半導體研究所副研究員、中科重儀半導體聯(lián)合創(chuàng)始人YAO WeizhenAssociate Professor of Institute of Semiconductors, Chinese Academy of Sciences, Co-founder of CASInstruments Semiconductor Co., Ltd.
    21200
    IFWS2025-01-09 14:42
  • 中科院蘇州納米所研究
    硅襯底GaN基光電材料外延生長Epitaxial Growth of GaN Based Photoelectric Materials on Silicon Substrate孫錢中國科學院蘇州納米技術與納米仿生研究所研究員SUN QianProfessorof Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences
    55400
    IFWS2025-01-09 14:41
  • 南京大學劉歡:等離子
    等離子體輔助分子束外延生長AlN薄膜AlN epilayers grown by plasma assisted molecular beam epitaxy劉歡南京大學LIU HuanNanjing University
    34400
    IFWS2025-01-09 14:40
  • 辰華半導體郭炳磊:用
    用于氮化鎵異質(zhì)外延的高溫PVD氮化鋁緩沖層技術High Temperature PVD AlN e Buffer Layer Technology for GaN Heteroepitaxy
    21100
    IFWS2025-01-09 14:28
  • 中電科第十三所高級工
    6英寸復合襯底上厚GaN外延生長研究Growth of Thick GaN Epilayers on 150mm Engineered Substrate韓穎中國電子科技集團第十三所高級工程師HAN YingSenior Engineer of Hebei Semiconductor Research Institute
    32400
    IFWS2025-01-09 14:27
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